Band bending of LiF/Alq3 interface in organic light-emitting diodes

The insertion of LiF for an interlayer material between the Al cathode and tris-(8-hydroxyquinoline) aluminum (Alq3) in the organic light-emitting diodes (OLEDs) provides an improved device performance. The highly occupied molecular orbital (HOMO) level lowering in the Alq3 layer induced by a low-coverage LiF deposition results in the reduction of electron injection barrier height. We investigated the electronic structure of the interface between the ultrathin LiF and the Alq3 layer, using synchrotron x-ray photoelectron emission spectroscopy. The results revealed that the major origin of the HOMO level lowering is not the chemical bonding of dissociated fluorine in the Alq3 layer but the band bending caused by charge redistribution driven by work function difference between LiF and Alq3 layer.