Orientation dependence of ferroelectric properties of pulsed-laser-ablated Bi4−xNdxTi3O12 films

Epitaxial (001)-, (118)-, and (104)-oriented Nd-doped Bi4Ti3O12 films have been grown by pulsed-laser deposition from a Bi4−xNdxTi3O12 (x=0.85) target on SrRuO3 coated single-crystal (100)-, (110)-, and (111)-oriented SrTiO3 substrates, respectively. X-ray diffraction illustrated a unique epitaxial...

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Veröffentlicht in:Applied physics letters 2003-09, Vol.83 (12), p.2414-2416
Hauptverfasser: Garg, A., Barber, Z. H., Dawber, M., Scott, J. F., Snedden, A., Lightfoot, P.
Format: Artikel
Sprache:eng
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Zusammenfassung:Epitaxial (001)-, (118)-, and (104)-oriented Nd-doped Bi4Ti3O12 films have been grown by pulsed-laser deposition from a Bi4−xNdxTi3O12 (x=0.85) target on SrRuO3 coated single-crystal (100)-, (110)-, and (111)-oriented SrTiO3 substrates, respectively. X-ray diffraction illustrated a unique epitaxial relationship between film and substrate for all orientations. We observed a strong dependence of ferroelectric properties on the film orientation, with no ferroelectric activity in an (001)-oriented film; a remanent polarization 2Pr of 12 μC/cm2 and coercive field Ec of 120 kV/cm in a (118)-oriented film; and 2Pr=40 μC/cm2, Ec=50 kV/cm in a (104)-oriented film. The lack of ferroelectric activity along the c-axis is consistent with the orthorhombic nature of the crystal structure of the bulk material, as determined by powder neutron diffraction.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1613052