Profiling and modeling of dc nitrogen microplasmas

This article explores electric current and field distributions in dc microplasmas, which have distinctive characteristics that are not evident at larger dimensions. These microplasmas, which are powered by coplanar thin-film metal electrodes with 400-μm minimum separations on a glass substrate, are...

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Veröffentlicht in:Journal of applied physics 2003-09, Vol.94 (5), p.2845-2851
Hauptverfasser: Wilson, Chester G., Gianchandani, Yogesh B., Arslanbekov, Robert R., Kolobov, Vladimir, Wendt, Amy E.
Format: Artikel
Sprache:eng
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Zusammenfassung:This article explores electric current and field distributions in dc microplasmas, which have distinctive characteristics that are not evident at larger dimensions. These microplasmas, which are powered by coplanar thin-film metal electrodes with 400-μm minimum separations on a glass substrate, are potentially useful for microsystems in both sensing and microfabrication contexts. Experiments in N2 ambient show that electron current favors electrode separations of 4 mm at 1.2 Torr, reducing to 0.4 mm at 10 Torr. The glow region is confined directly above the cathode, and within 200–500 μm of its lateral edge. Voltage gradients of 100 kV/m exist in this glow region at 1.2 Torr, increasing to 500 kV/m at 6 Torr, far in excess of those observed in larger plasmas. Numerical simulations indicate that the microplasmas are highly nonquasineutral, with a large ion density proximate to the cathode, responsible for a dense space-charge region, and the strong electric fields in the glow region. It is responsible for the bulk of the ionization and has a bimodal electron energy distribution function, with a local peak at 420 eV.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1595143