Nanometer-scale scanning sensors fabricated using stencil lithography

We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the l...

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Veröffentlicht in:Applied physics letters 2003-02, Vol.82 (7), p.1111-1113
Hauptverfasser: Champagne, A. R., Couture, A. J., Kuemmeth, F., Ralph, D. C.
Format: Artikel
Sprache:eng
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Zusammenfassung:We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1554483