Fabrication and characterization of a Pb5Ge3O11 one-transistor-memory device

A Pb5Ge3O11 metal–ferroelectric–metal–oxide–silicon memory transistor has been fabricated. The device showed a memory window of about 2 V. The memory window was almost saturated at the operation voltage of 2 V. The “off” state drain current (ID) at VD of 0.1 V and VG of 0.5 V is about 1×10−8 A. The...

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Veröffentlicht in:Applied physics letters 2001-09, Vol.79 (11), p.1661-1663
Hauptverfasser: Li, Tingkai, Hsu, Sheng Teng, Ulrich, Bruce, Ying, Hong, Stecker, Lisa, Evans, Dave, Ono, Yoshi, Maa, Jer-shen, Lee, J. J.
Format: Artikel
Sprache:eng
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Zusammenfassung:A Pb5Ge3O11 metal–ferroelectric–metal–oxide–silicon memory transistor has been fabricated. The device showed a memory window of about 2 V. The memory window was almost saturated at the operation voltage of 2 V. The “off” state drain current (ID) at VD of 0.1 V and VG of 0.5 V is about 1×10−8 A. The “on” state drain current (ID) at VD of 0.1 V and VG of 0.5 V is about 1×10−6 A, which is 100 times high than that of off state.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1401092