Fabrication and characterization of a Pb5Ge3O11 one-transistor-memory device
A Pb5Ge3O11 metal–ferroelectric–metal–oxide–silicon memory transistor has been fabricated. The device showed a memory window of about 2 V. The memory window was almost saturated at the operation voltage of 2 V. The “off” state drain current (ID) at VD of 0.1 V and VG of 0.5 V is about 1×10−8 A. The...
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Veröffentlicht in: | Applied physics letters 2001-09, Vol.79 (11), p.1661-1663 |
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Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | A Pb5Ge3O11 metal–ferroelectric–metal–oxide–silicon memory transistor has been fabricated. The device showed a memory window of about 2 V. The memory window was almost saturated at the operation voltage of 2 V. The “off” state drain current (ID) at VD of 0.1 V and VG of 0.5 V is about 1×10−8 A. The “on” state drain current (ID) at VD of 0.1 V and VG of 0.5 V is about 1×10−6 A, which is 100 times high than that of off state. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.1401092 |