Resonant interband tunnel diodes with AlGaSb barriers

The peak current density of InAs/AlSb/GaSb/AlSb/InAs resonant interband tunneling diodes has been enhanced by replacing the AlSb barriers with Al1−xGaxSb that has a narrower band gap. The devices were grown by molecular beam epitaxy and tested at room temperature. Diodes with nominally identical 7-M...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of applied physics 2001-05, Vol.89 (10), p.5791-5793
Hauptverfasser: Magno, R., Bracker, A. S., Bennett, B. R.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The peak current density of InAs/AlSb/GaSb/AlSb/InAs resonant interband tunneling diodes has been enhanced by replacing the AlSb barriers with Al1−xGaxSb that has a narrower band gap. The devices were grown by molecular beam epitaxy and tested at room temperature. Diodes with nominally identical 7-ML-thick ternary alloy barriers with x=0.35 are found to have peak current densities three times larger than those with AlSb barriers. The peak-to-valley current ratio decreases by only one third from 18 for the AlSb diodes to 12 for diodes with the ternary alloy barriers.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1365940