Differential interference contrast x-ray microscopy with submicron resolution

Progress in lithography and nanofabrication [E. Di Fabrizio et al., Nature (London) 401, 895 (1999)] has made it possible to apply differential interference contrast (DIC) in x-ray microscopy using an original x-ray doublet lens based on two specially developed zone plates. Switching from bright-fie...

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Veröffentlicht in:Applied physics letters 2001-04, Vol.78 (14), p.2082-2084
Hauptverfasser: Wilhein, Thomas, Kaulich, Burkhard, Di Fabrizio, Enzo, Romanato, Fillipo, Cabrini, Stefano, Susini, Jean
Format: Artikel
Sprache:eng
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Zusammenfassung:Progress in lithography and nanofabrication [E. Di Fabrizio et al., Nature (London) 401, 895 (1999)] has made it possible to apply differential interference contrast (DIC) in x-ray microscopy using an original x-ray doublet lens based on two specially developed zone plates. Switching from bright-field imaging (absorption contrast) to x-ray DIC, we observe, similar to visible-light microscopy, a dramatic increase in image contrast for weak absorbing samples. We anticipate that this technique will have a significant impact on x-ray imaging and may play a role comparable to DIC imaging in visible-light microscopy.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1360776