Oxidation kinetics in SrTiO3 homoepitaxy on SrTiO3(001)
Using an oblique-incidence optical reflectivity difference technique, we investigated kinetic processes in SrTiO3 homoepitaxy on SrTiO3(001) under pulsed-laser deposition conditions. Depending upon growth temperature and oxygen ambient pressure, we found that the oxidation of an as-grown SrTiO3 mono...
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| Veröffentlicht in: | Applied physics letters 2001-01, Vol.78 (4), p.460-462 |
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| container_end_page | 462 |
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| container_title | Applied physics letters |
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| creator | Zhu, X. D. Si, Weidong Xi, X. X. Jiang, Qidu |
| description | Using an oblique-incidence optical reflectivity difference technique, we investigated kinetic processes in SrTiO3 homoepitaxy on SrTiO3(001) under pulsed-laser deposition conditions. Depending upon growth temperature and oxygen ambient pressure, we found that the oxidation of an as-grown SrTiO3 monolayer may take a much longer time to complete than the recrystallization of the monolayer. The oxidation reaction was found to be characterized by an effective activation energy barrier of 1.35 eV and a large preexponential factor. |
| doi_str_mv | 10.1063/1.1338497 |
| format | Article |
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| identifier | ISSN: 0003-6951 |
| ispartof | Applied physics letters, 2001-01, Vol.78 (4), p.460-462 |
| issn | 0003-6951 1077-3118 |
| language | eng |
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| source | AIP Journals Complete; AIP Digital Archive |
| title | Oxidation kinetics in SrTiO3 homoepitaxy on SrTiO3(001) |
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