Oxidation kinetics in SrTiO3 homoepitaxy on SrTiO3(001)

Oxidation kinetics in SrTiO3 homoepitaxy on SrTiO3(001)

Using an oblique-incidence optical reflectivity difference technique, we investigated kinetic processes in SrTiO3 homoepitaxy on SrTiO3(001) under pulsed-laser deposition conditions. Depending upon growth temperature and oxygen ambient pressure, we found that the oxidation of an as-grown SrTiO3 mono...

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Veröffentlicht in:Applied physics letters 2001-01, Vol.78 (4), p.460-462
Hauptverfasser: Zhu, X. D., Si, Weidong, Xi, X. X., Jiang, Qidu
Format: Artikel
Sprache:eng
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Zusammenfassung:Using an oblique-incidence optical reflectivity difference technique, we investigated kinetic processes in SrTiO3 homoepitaxy on SrTiO3(001) under pulsed-laser deposition conditions. Depending upon growth temperature and oxygen ambient pressure, we found that the oxidation of an as-grown SrTiO3 monolayer may take a much longer time to complete than the recrystallization of the monolayer. The oxidation reaction was found to be characterized by an effective activation energy barrier of 1.35 eV and a large preexponential factor.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1338497