Conductive layer near the GaN/sapphire interface and its effect on electron transport in unintentionally doped n -type GaN epilayers

Temperature-dependent Hall effect measurements on unintentionally doped n-type GaN epilayers show that, above room temperature, the Hall-mobility values of different samples vary parallel with each other with temperature. We demonstrate that this anomaly is mainly due to a conductive layer near the...

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Veröffentlicht in:Applied physics letters 2000-10, Vol.77 (16), p.2557-2559
Hauptverfasser: Cheong, M. G., Kim, K. S., Oh, C. S., Namgung, N. W., Yang, G. M., Hong, C.-H., Lim, K. Y., Suh, E.-K., Nahm, K. S., Lee, H. J., Lim, D. H., Yoshikawa, A.
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Sprache:eng
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Zusammenfassung:Temperature-dependent Hall effect measurements on unintentionally doped n-type GaN epilayers show that, above room temperature, the Hall-mobility values of different samples vary parallel with each other with temperature. We demonstrate that this anomaly is mainly due to a conductive layer near the GaN/sapphire interface for thin samples with low carrier density. Through trapping electrons, threading edge dislocations (TEDs) debilitate the epilayer contribution in a two-layer mixed conduction model involving the epilayer and the near-interface layer. The trapping may, in part, explain low mobility and anomalous transport in pure GaN layers. Scattering by TEDs is important only at low temperatures.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1318728