Temporal fluctuations: A fingerprint of surface chemical reactions
A real-time fast Fourier transform of temporal fluctuations of optical emission and rf power signals captures surface chemical reactions. The observed fluctuations, previously considered as noise and traditionally time averaged, depend on process chemistry and surface materials. The coherent optical...
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Veröffentlicht in: | Applied physics letters 2000-06, Vol.76 (24), p.3641-3643 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | A real-time fast Fourier transform of temporal fluctuations of optical emission and rf power signals captures surface chemical reactions. The observed fluctuations, previously considered as noise and traditionally time averaged, depend on process chemistry and surface materials. The coherent optical emission fluctuations are specific only to the etch by-products. Plausible explanations, such as plasma density or electron temperature modulations, plasma instabilities, rf coupling modulations, or external hardware effects are dismissed by the data. It has been confirmed that the observed frequency patterns are directly related to surface chemical reactions of the film exposed to the plasma. This finding can be used to diagnose, monitor, and control chemical surface reactions in real time. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.126733 |