Bulk and surface recombination in InAs/AlAs0.16Sb0.84 3.45 μm light emitting diodes
A study of the light generation efficiency of a series of InAs/AlAs0.16Sb0.84 light emitting diodes with p-type InAs active layers is reported. The bulk low-injection radiative efficiency of the p-type material is shown to be as high as 24% at a hole concentration of 1.5×1017 cm−3 but to decrease wi...
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Veröffentlicht in: | Applied physics letters 2000-02, Vol.76 (8), p.943-945 |
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description | A study of the light generation efficiency of a series of InAs/AlAs0.16Sb0.84 light emitting diodes with p-type InAs active layers is reported. The bulk low-injection radiative efficiency of the p-type material is shown to be as high as 24% at a hole concentration of 1.5×1017 cm−3 but to decrease with increasing hole concentration in a manner consistent with the dominant low-injection nonradiative processes being Auger processes with two holes in their initial states and a total rate constant of 2×10−28 cm6 s−1. The maximum internal low-drive quantum efficiency achieved in the light emitting diodes is shown to be limited by interface recombination at the InAs/AlAs0.16Sb0.84 heterojunction and reabsorption in the active layer in addition to the bulk nonradiative processes in the InAs. A maximum value of ∼9% is achieved. |
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J. ; Braithwaite, G. ; Emeny, M. T. ; Lee, D. ; Martin, T. ; Wright, D. R.</creator><creatorcontrib>Kane, M. J. ; Braithwaite, G. ; Emeny, M. T. ; Lee, D. ; Martin, T. ; Wright, D. R.</creatorcontrib><description>A study of the light generation efficiency of a series of InAs/AlAs0.16Sb0.84 light emitting diodes with p-type InAs active layers is reported. The bulk low-injection radiative efficiency of the p-type material is shown to be as high as 24% at a hole concentration of 1.5×1017 cm−3 but to decrease with increasing hole concentration in a manner consistent with the dominant low-injection nonradiative processes being Auger processes with two holes in their initial states and a total rate constant of 2×10−28 cm6 s−1. The maximum internal low-drive quantum efficiency achieved in the light emitting diodes is shown to be limited by interface recombination at the InAs/AlAs0.16Sb0.84 heterojunction and reabsorption in the active layer in addition to the bulk nonradiative processes in the InAs. 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T.</creatorcontrib><creatorcontrib>Lee, D.</creatorcontrib><creatorcontrib>Martin, T.</creatorcontrib><creatorcontrib>Wright, D. R.</creatorcontrib><title>Bulk and surface recombination in InAs/AlAs0.16Sb0.84 3.45 μm light emitting diodes</title><title>Applied physics letters</title><description>A study of the light generation efficiency of a series of InAs/AlAs0.16Sb0.84 light emitting diodes with p-type InAs active layers is reported. The bulk low-injection radiative efficiency of the p-type material is shown to be as high as 24% at a hole concentration of 1.5×1017 cm−3 but to decrease with increasing hole concentration in a manner consistent with the dominant low-injection nonradiative processes being Auger processes with two holes in their initial states and a total rate constant of 2×10−28 cm6 s−1. The maximum internal low-drive quantum efficiency achieved in the light emitting diodes is shown to be limited by interface recombination at the InAs/AlAs0.16Sb0.84 heterojunction and reabsorption in the active layer in addition to the bulk nonradiative processes in the InAs. A maximum value of ∼9% is achieved.</description><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNotkEtOwzAURS0EEqEgsQQPmST18y_JMFRQKlViQBlH9rNdDPmgOB2wN9bAmigqo6M7OVc6hNwCK4BpsYQCuKoBzkgGrCxzAVCdk4wxJnJdK7gkVym9H6fiQmRkd3_oPqgZHE2HKRj0dPI49jYOZo7jQONAN0OTlk3XpOODfrGsqCQVhVT057unXdy_zdT3cZ7jsKcujs6na3IRTJf8zT8X5PXxYbd6yrfP682q2ebIuZpzxBDKEGzp0FitpQsowDqUUhqlmAloFRoPqGSFXLvaMy6l57qSde3AigW5O3lxGlOafGg_p9ib6asF1v7VaKE91RC_ixRRBA</recordid><startdate>20000221</startdate><enddate>20000221</enddate><creator>Kane, M. J.</creator><creator>Braithwaite, G.</creator><creator>Emeny, M. 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R.</creatorcontrib><collection>CrossRef</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kane, M. J.</au><au>Braithwaite, G.</au><au>Emeny, M. T.</au><au>Lee, D.</au><au>Martin, T.</au><au>Wright, D. R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Bulk and surface recombination in InAs/AlAs0.16Sb0.84 3.45 μm light emitting diodes</atitle><jtitle>Applied physics letters</jtitle><date>2000-02-21</date><risdate>2000</risdate><volume>76</volume><issue>8</issue><spage>943</spage><epage>945</epage><pages>943-945</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>A study of the light generation efficiency of a series of InAs/AlAs0.16Sb0.84 light emitting diodes with p-type InAs active layers is reported. The bulk low-injection radiative efficiency of the p-type material is shown to be as high as 24% at a hole concentration of 1.5×1017 cm−3 but to decrease with increasing hole concentration in a manner consistent with the dominant low-injection nonradiative processes being Auger processes with two holes in their initial states and a total rate constant of 2×10−28 cm6 s−1. The maximum internal low-drive quantum efficiency achieved in the light emitting diodes is shown to be limited by interface recombination at the InAs/AlAs0.16Sb0.84 heterojunction and reabsorption in the active layer in addition to the bulk nonradiative processes in the InAs. A maximum value of ∼9% is achieved.</abstract><doi>10.1063/1.125911</doi><tpages>3</tpages></addata></record> |
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title | Bulk and surface recombination in InAs/AlAs0.16Sb0.84 3.45 μm light emitting diodes |
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