Photoluminescence and ultraviolet lasing of polycrystalline ZnO thin films prepared by the oxidation of the metallic Zn

We report a simple method for preparing polycrystalline ZnO thin films with good luminescent properties: the oxidization of metallic Zn films. In photoluminescence (PL) studies at room temperature for wavelengths between 370 and 675 nm, we have observed a single exciton peak around 390 nm without an...

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Veröffentlicht in:Applied physics letters 1999-11, Vol.75 (18), p.2761-2763
Hauptverfasser: Cho, Sunglae, Ma, Jing, Kim, Yunki, Sun, Yi, Wong, George K. L., Ketterson, John B.
Format: Artikel
Sprache:eng
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Zusammenfassung:We report a simple method for preparing polycrystalline ZnO thin films with good luminescent properties: the oxidization of metallic Zn films. In photoluminescence (PL) studies at room temperature for wavelengths between 370 and 675 nm, we have observed a single exciton peak around 390 nm without any deep-level emission and a small PL full width at half maximum (23 meV), indicating that the concentrations of the defects responsible for the deep-level emissions are negligible. We have also observed optically pumped lasing action in these films. The threshold intensity for lasing was ∼9 MW/cm2.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.125141