Measurement of mechanical resonance and losses in nanometer scale silicon wires

Measurement of mechanical resonance and losses in nanometer scale silicon wires

We present data on nanofabricated suspended silicon wires driven at resonance. The wires are electrostatically driven and detected optically. We have observed wires with widths as small as 45 nm and resonant frequencies as high as 380 MHz. We see a strong dependence of the resonant quality factor on...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 1999-08, Vol.75 (7), p.920-922
Hauptverfasser: Carr, Dustin W., Evoy, S., Sekaric, L., Craighead, H. G., Parpia, J. M.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We present data on nanofabricated suspended silicon wires driven at resonance. The wires are electrostatically driven and detected optically. We have observed wires with widths as small as 45 nm and resonant frequencies as high as 380 MHz. We see a strong dependence of the resonant quality factor on the surface to volume ratio.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.124554