Microstructuring of silicon with femtosecond laser pulses

Microstructuring of silicon with femtosecond laser pulses

We report that silicon surfaces develop an array of sharp conical spikes when irradiated with 500 laser pulses of 100-fs duration, 10-kJ/m2 fluence in 500-Torr SF6 or Cl2. The spikes are up to 40-μm tall, and taper to about 1-μm diam at the tip. Irradiation of silicon surfaces in N2, Ne, or vacuum c...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 1998-09, Vol.73 (12), p.1673-1675
Hauptverfasser: Her, Tsing-Hua, Finlay, Richard J., Wu, Claudia, Deliwala, Shrenik, Mazur, Eric
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We report that silicon surfaces develop an array of sharp conical spikes when irradiated with 500 laser pulses of 100-fs duration, 10-kJ/m2 fluence in 500-Torr SF6 or Cl2. The spikes are up to 40-μm tall, and taper to about 1-μm diam at the tip. Irradiation of silicon surfaces in N2, Ne, or vacuum creates structured surfaces, but does not create sharp conical spikes.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.122241