Fabrication of photonic crystals by deep x-ray lithography

Fabrication of photonic crystals by deep x-ray lithography

We have developed a new microfabrication technique for the construction of three-dimensional photonic crystals. In particular, we used multiple tilted x-ray lithography exposures in order to construct structures with photonic band gaps in the infrared region. First polymethylmethacrylate (PMMA) resi...

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Veröffentlicht in:Applied Physics Letters 1997-09, Vol.71 (11), p.1441-1443
Hauptverfasser: Feiertag, G., Ehrfeld, W., Freimuth, H., Kolle, H., Lehr, H., Schmidt, M., Sigalas, M. M., Soukoulis, C. M., Kiriakidis, G., Pedersen, T., Kuhl, J., Koenig, W.
Format: Artikel
Sprache:eng
Schlagworte:
CRYSTALS
FABRICATION
INSTRUMENTATION, INCLUDING NUCLEAR AND PARTICLE DETECTORS
LAYERS
LIGHT TRANSMISSION
PERMITTIVITY
PHYSICS
PMMA
POLYMERS
RADIATION EFFECTS
SILICON CARBIDES
SILICON COMPOUNDS
SILICON NITRIDES
X-RAY EQUIPMENT
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Beschreibung
Zusammenfassung:We have developed a new microfabrication technique for the construction of three-dimensional photonic crystals. In particular, we used multiple tilted x-ray lithography exposures in order to construct structures with photonic band gaps in the infrared region. First polymethylmethacrylate (PMMA) resist layers with a thickness of 500 μm were irradiated, then the holes in the resist structure were filled with preceramic polymer and subsequent pyrolysis converts the preceramic polymer into a SiCN ceramic. Theoretical results with fitted values of the dielectric constant are in good agreement with the transmission measurements.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.120431