Secondary electron emission from boron-doped diamond under ion impact: Applications in single-ion detection

The secondary electron emission from a 2 μm thick boron-doped diamond film under ion (4.6–7.7 MeV He+)impact is reported. The yield under ions impact is found to be remarkably high, stable over a period of many months, and independent of which side of the film (i.e., growth or substrate side) is exp...

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Veröffentlicht in:Applied Physics Letters 1997-09, Vol.71 (13), p.1875-1877
Hauptverfasser: Kamiya, Tomihiro, Cholewa, Marian, Saint, Andrew, Prawer, Steven, Legge, George J. F., Butler, James E., Vestyck, Daniel J.
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Sprache:eng
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Zusammenfassung:The secondary electron emission from a 2 μm thick boron-doped diamond film under ion (4.6–7.7 MeV He+)impact is reported. The yield under ions impact is found to be remarkably high, stable over a period of many months, and independent of which side of the film (i.e., growth or substrate side) is exposed to the ion flux. By taking advantage of the high secondary-electron yield, the passage of each ion through the film could be detected with an efficiency of close to 100%, which to the best of our knowledge is the highest efficiency recorded to date for any thin-film window. This finding has an immediate application in single-ion irradiation systems where a thin vacuum window is required to allow extraction of an ion beam from the vacuum into air and at the same time offer 100% efficiency for the detection of the passage of the ion through the window.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.120190