Direct atomic flux measurement of electron-beam evaporated yttrium with a diode-laser-based atomic absorption monitor at 668 nm

Direct atomic flux measurement of electron-beam evaporated yttrium with a diode-laser-based atomic absorption monitor at 668 nm

A direct measurement of atomic flux in e-beam evaporated yttrium has been demonstrated with a diode-laser-based atomic absorption (AA) monitor at 668 nm. Atomic number density and velocity were measured through absorption and Doppler shift measurements to provide the atomic flux. The AA-based deposi...

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Veröffentlicht in:Applied Physics Letters 1997-07, Vol.71 (1), p.31-33
Hauptverfasser: Wang, Weizhi, Hammond, R. H., Fejer, M. M., Arnason, S., Beasley, M. R., Bortz, M. L., Day, T.
Format: Artikel
Sprache:eng
Schlagworte:
ELECTRON BEAMS
EVAPORATION
FLUX DENSITY
MATERIALS SCIENCE
MONITORING
PHYSICAL VAPOR DEPOSITION
PHYSICS
VELOCITY
VISIBLE SPECTRA
YTTRIUM
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Zusammenfassung:A direct measurement of atomic flux in e-beam evaporated yttrium has been demonstrated with a diode-laser-based atomic absorption (AA) monitor at 668 nm. Atomic number density and velocity were measured through absorption and Doppler shift measurements to provide the atomic flux. The AA-based deposition rates were compared with independent quartz crystal monitors showing agreement between the two methods.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.119460