Determination of flux ionization fraction using a quartz crystal microbalance and a gridded energy analyzer in an ionized magnetron sputtering system

A diagnostic which combines a quartz crystal microbalance (QCM) and a gridded energy analyzer has been developed to measure the metal flux ionization fraction in a modified commercial dc magnetron sputtering device. The sensor is mounted on a linear motion feedthrough and embedded in a slot in the s...

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Veröffentlicht in:Review of scientific instruments 1997-12, Vol.68 (12), p.4555-4560
Hauptverfasser: Green, K. M., Hayden, D. B., Juliano, D. R., Ruzic, D. N.
Format: Artikel
Sprache:eng
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Zusammenfassung:A diagnostic which combines a quartz crystal microbalance (QCM) and a gridded energy analyzer has been developed to measure the metal flux ionization fraction in a modified commercial dc magnetron sputtering device. The sensor is mounted on a linear motion feedthrough and embedded in a slot in the substrate plane to allow for measuring the uniformity in deposition and ionization throughout the plane of the wafer. Radio-frequency (rf) power is introduced through a coil to ionize the Al atoms. The metal flux ionization fraction at the QCM is determined by comparing the total deposition rate with and without a bias that screens out the ions, but that leaves the plasma undisturbed. By varying the voltage applied to the grids, the plasma potential is determined. At a pressure of 35 mTorr, a magnetron power of 2 kW, and a net rf power of 310 ± 5 W, 78 ± 5% ionization was found.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.1148430