Surface plasma source to generate high‐brightness H− beams for ion projection lithography (abstract)a

A surface plasma source with Penning‐type electrodes is developed to generate H− beams for ion projection lithography applications. The source presently runs in pulsed mode with a pulse width of about 1 ms and repetition rate of 10 Hz. The discharge and the extracted H− beam are maintained in stable, noiseless condition; gas pressure plays a critical role here. The maximum H− beam current density at the emission surface is about 1.7 A/cm2. Preliminary measurements suggest that the normalized brightness of the core beam is ∼1.7×1013 A/(m rad)2 and its perpendicular temperature is about 0.2 eV.