Atomic oxygen detection by a silver‐coated quartz deposition monitor
A method for measuring the flux of atomic oxygen utilizing a silver film on a quartz‐crystal deposition rate monitor is described. Measuring the initial oxidation rate of the silver, which is proportional to the atomic oxygen flux, determines a lower limit on the atomic oxygen flux. This method is m...
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| Veröffentlicht in: | Review of scientific instruments 1990-06, Vol.61 (6), p.1747-1749 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
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| Online-Zugang: | Volltext |
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| Zusammenfassung: | A method for measuring the flux of atomic oxygen utilizing a silver film on a quartz‐crystal deposition rate monitor is described. Measuring the initial oxidation rate of the silver, which is proportional to the atomic oxygen flux, determines a lower limit on the atomic oxygen flux. This method is more direct than measuring the conductance of the silver film, has an intrinsic flux detection range of 101
3–101
7 atoms/cm2 s, and is reversible by exposing the sensor to an atomic hydrogen flux. |
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| ISSN: | 0034-6748 1089-7623 |
| DOI: | 10.1063/1.1141145 |