Titanium dioxide photocatalysts produced by reactive magnetron sputtering
A process is described for the deposition of anatase titanium dioxide films by reactive magnetron sputtering. The films have a porous columnar morphology with a high effective surface area making them well suited to be used as photocatalysts. Data are presented on the use of such films in the photoc...
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| Veröffentlicht in: | Applied physics letters 1995-05, Vol.66 (18), p.2409-2411 |
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| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | A process is described for the deposition of anatase titanium dioxide films by reactive magnetron sputtering. The films have a porous columnar morphology with a high effective surface area making them well suited to be used as photocatalysts. Data are presented on the use of such films in the photocatalytic decomposition of gas phase pollutants in air. |
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| ISSN: | 0003-6951 1077-3118 |
| DOI: | 10.1063/1.113956 |