Bond-structure changes of liquid phase deposited oxide (SiO2− x F x ) on N2 annealing
Fluorine can be naturally incorporated into the silicon oxide (SiO2−xFx) prepared by the liquid phase deposition (LPD) method at 35 °C. Fourier transform infrared and x-ray photoelectron spectroscopy spectra show that an annealing treatment can change its bond-structure. Changes in properties accomp...
Gespeichert in:
Veröffentlicht in: | Applied physics letters 1995-02, Vol.66 (8), p.938-940 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Fluorine can be naturally incorporated into the silicon oxide (SiO2−xFx) prepared by the liquid phase deposition (LPD) method at 35 °C. Fourier transform infrared and x-ray photoelectron spectroscopy spectra show that an annealing treatment can change its bond-structure. Changes in properties accompanying the restructuring are also observed. The annealing also densifies the LPD oxide and reduces its thickness because Si–F intensity decreases and the Si–O–Si intensity increases as annealing temperature increases. |
---|---|
ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.113603 |