Epitaxial KNbO3 thin films on KTaO3, MgAl2O4, and MgO substrates

Epitaxial potassium niobate (KNbO3) thin films have been deposited on KTaO3 (100), MgAl2O4 (100), and MgO (100) substrates using ion-beam sputter deposition. X-ray-diffraction results show that KNbO3 films have orthorhombic (110) orientation on all three substrates. Rutherford backscattering channel...

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Veröffentlicht in:Applied physics letters 1994-08, Vol.65 (9), p.1073-1075
Hauptverfasser: Chow, A. F., Lichtenwalner, D. J., Woolcott, R. R., Graettinger, T. M., Auciello, O., Kingon, A. I., Boatner, L. A., Parikh, N. R.
Format: Artikel
Sprache:eng
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Zusammenfassung:Epitaxial potassium niobate (KNbO3) thin films have been deposited on KTaO3 (100), MgAl2O4 (100), and MgO (100) substrates using ion-beam sputter deposition. X-ray-diffraction results show that KNbO3 films have orthorhombic (110) orientation on all three substrates. Rutherford backscattering channeling analysis of KNbO3 films on KTaO3, MgAl2O4, and MgO exhibits minimum scattering yields (χmin) of 7%, 9%, and 18% for the Nb peak, respectively. This illustrates how the quality of epitaxy improves as the lattice mismatch decreases. Prism-coupling measurements reveal near-bulk refractive indices of about 2.27 for TE modes and 2.22 for TM modes for films on each substrate.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.112129