Sputter deposited strontium ferrite films with c -axis oriented normal to the film plane

M-type strontium ferrite films were deposited by radio-frequency (rf) sputtering on fused quartz substrates kept at ambient temperatures. The as-deposited films were amorphous. They crystallized on annealing at a temperature of 800 °C or higher. The films deposited at low rf power and low oxygen to...

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Veröffentlicht in:Applied physics letters 1994-03, Vol.64 (12), p.1579-1581
Hauptverfasser: Acharya, B. Ramamurthy, Krishnan, R., Prasad, Shiva, Venkataramani, N., Ajan, Antony, Shringi, S. N.
Format: Artikel
Sprache:eng
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Zusammenfassung:M-type strontium ferrite films were deposited by radio-frequency (rf) sputtering on fused quartz substrates kept at ambient temperatures. The as-deposited films were amorphous. They crystallized on annealing at a temperature of 800 °C or higher. The films deposited at low rf power and low oxygen to argon ratio showed c-axis orientation normal to the film plane. The magnetic properties of these films were studied using vibrating sample magnetometer, polar Kerr rotation, and torque magnetometer. The perpendicular M-H loops for c-axis oriented films were nearly rectangular with coercivity of the order of 3 kOe.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.111845