Two-dimensional hybrid model of inductively coupled plasma sources for etching

Inductively coupled plasmas (ICPs) are currently being investigated as high density (≳1011–1012 cm−3), low pressure (

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Bibliographische Detailangaben
Veröffentlicht in:	Applied physics letters 1993-08, Vol.63 (5), p.605-607
Hauptverfasser:	VENTZEK, P. L. G, SOMMERER, T. J, HOEKSTRA, R. J, KUSHNER, M. J
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma production and heating Plasma sources Surface treatments
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	Inductively coupled plasmas (ICPs) are currently being investigated as high density (≳1011–1012 cm−3), low pressure (
ISSN:	0003-6951 1077-3118
DOI:	10.1063/1.109963