In situ approach to realization of three-dimensionally confined structures via substrate encoded size reducing epitaxy on nonplanar patterned substrates

We report the first realization of three-dimensionally confined semiconductor heterostructures via a one-step growth on nonplanar patterned substrate. Truncated pyramidal shaped mesas on GaAs (111)B patterned substrates are employed and a substrate encoded size reducing epitaxical growth process exp...

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Veröffentlicht in:Applied physics letters 1993-03, Vol.62 (13), p.1547-1549
Hauptverfasser: MADHUKAR, A, RAJKUMAR, K. C, CHEN, P
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Sprache:eng
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