NF3 PLASMA GENERATION BY COMMERCIAL 50 HZ ALTERNATING-CURRENT DISCHARGE FOR DRY ETCHING

NF3 PLASMA GENERATION BY COMMERCIAL 50 HZ ALTERNATING-CURRENT DISCHARGE FOR DRY ETCHING

We generate NF3 plasma for the first time by commercial 50 Hz ac discharge. Mass and energy analysis of the plasma shows the predominant positive ion NF2+, followed by the NF3+ parent ion, NF+, and F+. The measured energy distribution of the ions corresponds to the energy distribution expected from...

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Veröffentlicht in:Applied physics letters 1992-11, Vol.61 (18), p.2159-2161
Hauptverfasser: KONUMA, M, BAUSER, E
Format: Artikel
Sprache:eng
Schlagworte:
Exact sciences and technology
Physical Sciences
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Physics, Applied
Science & Technology
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Zusammenfassung:We generate NF3 plasma for the first time by commercial 50 Hz ac discharge. Mass and energy analysis of the plasma shows the predominant positive ion NF2+, followed by the NF3+ parent ion, NF+, and F+. The measured energy distribution of the ions corresponds to the energy distribution expected from the time dependent plasma potential in a 50 Hz discharge. The plasma can be applied for native oxide removal from Si substrates.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.108280