X-ray photoelectron spectroscopy of ammonium sulfide treated GaAs (100) surfaces

The effect of an ammonium sulfide treatment on the GaAs (100) surface has been investigated by x-ray photoelectron spectroscopy. The treatment produces a slight Ga enrichment on the surface and leaves roughly 0.6 of a monolayer of sulfide which inhibits initial oxidation of the surface. The sulfide...

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Veröffentlicht in:Appl. Phys. Lett.; (United States) 1989-01, Vol.54 (4), p.365-367
Hauptverfasser: COWANS, B. A, DARDAS, Z, DELGASS, W. N, CARPENTER, M. S, MELLOCH, M. R
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Sprache:eng
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Zusammenfassung:The effect of an ammonium sulfide treatment on the GaAs (100) surface has been investigated by x-ray photoelectron spectroscopy. The treatment produces a slight Ga enrichment on the surface and leaves roughly 0.6 of a monolayer of sulfide which inhibits initial oxidation of the surface. The sulfide is not lost as the surface becomes oxidized but appears to remain near the GaAs/oxide interface. Furthermore, in the oxidized layer, As oxide is preferentially drawn to the surface relative to Ga oxide.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.100970