X-ray photoelectron spectroscopy of ammonium sulfide treated GaAs (100) surfaces
The effect of an ammonium sulfide treatment on the GaAs (100) surface has been investigated by x-ray photoelectron spectroscopy. The treatment produces a slight Ga enrichment on the surface and leaves roughly 0.6 of a monolayer of sulfide which inhibits initial oxidation of the surface. The sulfide...
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Veröffentlicht in: | Appl. Phys. Lett.; (United States) 1989-01, Vol.54 (4), p.365-367 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The effect of an ammonium sulfide treatment on the GaAs (100) surface has been investigated by x-ray photoelectron spectroscopy. The treatment produces a slight Ga enrichment on the surface and leaves roughly 0.6 of a monolayer of sulfide which inhibits initial oxidation of the surface. The sulfide is not lost as the surface becomes oxidized but appears to remain near the GaAs/oxide interface. Furthermore, in the oxidized layer, As oxide is preferentially drawn to the surface relative to Ga oxide. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.100970 |