Theory of polymer ablation

A new formula is presented for the etch depth l per pulse of an excimer laser of fluence F. Incremental ablation is defined as the etch depth per pulse after many pulses. We show that l is proportional to F, rather than ln(F).

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Appl. Phys. Lett.; (United States) 1988-12, Vol.53 (24), p.2377-2379
Hauptverfasser: MAHAN, G. D, COLE, H. S, LIU, Y. S, PHILIPP, H. R
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A new formula is presented for the etch depth l per pulse of an excimer laser of fluence F. Incremental ablation is defined as the etch depth per pulse after many pulses. We show that l is proportional to F, rather than ln(F).
ISSN:0003-6951
1077-3118
DOI:10.1063/1.100235