Work hardening and strain relaxation in strained-layer buffers

Fully relaxed buffer layers are of considerable importance for growth of high quality crystals on substrates having different lattice parameters. Recent experiments by Biefeld et al. [R. M. Biefeld, C. R. Hills, and S. R. Lee, J. Cryst. Growth (in press)] in the InAsSb system show that the degree of...

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Veröffentlicht in:Appl. Phys. Lett.; (United States) 1988-07, Vol.53 (1), p.37-38
1. Verfasser: DODSON, B. W
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description Fully relaxed buffer layers are of considerable importance for growth of high quality crystals on substrates having different lattice parameters. Recent experiments by Biefeld et al. [R. M. Biefeld, C. R. Hills, and S. R. Lee, J. Cryst. Growth (in press)] in the InAsSb system show that the degree of relaxation is considerably less than expected using conventional equilibrium models, but is more complete in continuously graded than in step-graded buffer layers. In the present letter, this observation is explained in terms of Taylor-type (dislocation interaction) work hardening.
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ispartof Appl. Phys. Lett.; (United States), 1988-07, Vol.53 (1), p.37-38
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1077-3118
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subjects 360603 - Materials- Properties
ANTIMONY COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
Condensed matter: structure, mechanical and thermal properties
CRYSTAL DEFECTS
CRYSTAL STRUCTURE
DISLOCATIONS
Exact sciences and technology
FABRICATION
HARDENING
INDIUM ARSENIDES
INDIUM COMPOUNDS
LATTICE PARAMETERS
LINE DEFECTS
MATERIALS SCIENCE
Physics
PNICTIDES
RELAXATION
STRAINS
STRESS RELAXATION
SUPERLATTICES
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
title Work hardening and strain relaxation in strained-layer buffers
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