Phosphorus doped hierarchical porous carbon: an efficient oxygen reduction electrocatalyst for on-site H 2 O 2 production
The electrochemical oxygen reduction reaction through a two-electron process (2e − ORR) has been considered a promising alternative for on-site hydrogen peroxide (H 2 O 2 ) production. Nevertheless, exploring low-cost and stable electrocatalysts with higher activity and selectivity remains a great c...
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Veröffentlicht in: | Inorganic chemistry frontiers 2023-06, Vol.10 (12), p.3632-3640 |
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Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The electrochemical oxygen reduction reaction through a two-electron process (2e
−
ORR) has been considered a promising alternative for
on-site
hydrogen peroxide (H
2
O
2
) production. Nevertheless, exploring low-cost and stable electrocatalysts with higher activity and selectivity remains a great challenge in practical applications. Herein, a novel phosphorus-doped macro/meso/micro-porous carbon (P-MC) electrocatalyst was successfully synthesized using sodium phytate (SP) as the precursor, which can not only change the electronic structure of carbon by P-doping, but also regulate the pore structure of the material with self-decomposition. Therefore, the prepared P-MC possesses excellent electrocatalytic performance and stability for 2e
−
ORR. When tested in 0.1 M KOH, the P-MC exhibits an outstanding faradaic efficiency (FE%) over 98% (0.3 V–0.5 V
vs.
RHE) and a higher H
2
O
2
yield of 8.4 mol h
−1
g
cat.
−1
, which is 16.8 times higher than that of MC prepared with glucose as a precursor (0.5 mol h
−1
g
cat.
−1
). Interestingly, the
on-site
produced H
2
O
2
can be successfully used for efficient disinfection and water treatment, which can solve the problems of high cost, environmental pollution, and potential risks in current H
2
O
2
industrial production. This study provides a convenient strategy for designing highly active carbon-based electrocatalysts by simultaneously regulating their electronic and pore structure. |
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ISSN: | 2052-1553 2052-1553 |
DOI: | 10.1039/D3QI00668A |