α-Si 3 N 4 dendrites and whiskers fabricated using electron irradiation technology

Silicon nitride (Si 3 N 4 ) has great potential for applications in photoelectric and semiconductor fields. In this study, a novel strategy of fabricating Si 3 N 4 crystals is reported, and the morphology of α-Si 3 N 4 can be controlled. The aBN/SiO 2 /Si wafers were designed and irradiated by a hig...

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Veröffentlicht in:CrystEngComm 2024-03, Vol.26 (10), p.1464-1471
Hauptverfasser: Qiu, Mengting, Lu, Yunxiang, Jia, Zhenglin, Yang, Mingyang, Hu, Xiaofei, Hao, Mingxin, Nishimura, Kazuhito, Jiang, Nan, Yuan, Qilong, Lin, Cheng-Te, Cui, Junfeng
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Sprache:eng
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Zusammenfassung:Silicon nitride (Si 3 N 4 ) has great potential for applications in photoelectric and semiconductor fields. In this study, a novel strategy of fabricating Si 3 N 4 crystals is reported, and the morphology of α-Si 3 N 4 can be controlled. The aBN/SiO 2 /Si wafers were designed and irradiated by a high-energy electron beam for 2 min using home-made equipment. Tree-like α-Si 3 N 4 dendrites and [001]-oriented unbranched α-Si 3 N 4 whiskers can be synthesized by controlling the electron beam energy. Related formation mechanisms were analyzed based on componential and structural characterization using a scanning electron microscope and high-resolution transmission electron microscope. In addition, photoluminescence measurements indicate that the synthesized α-Si 3 N 4 exhibit unique photoluminescence properties. This is attributed to α-Si 3 N 4 forming abundant Si–Si bonds, Si dangling bonds, N dangling bonds and oxygen bonds in the synthesis process. These findings provide new insights into fabricating high-quality Si 3 N 4 crystals, as well as developing related high-performance micro- or nano-devices.
ISSN:1466-8033
1466-8033
DOI:10.1039/D3CE01235B