Layer-dependent SERS enhancement of TiS 2 prepared by simple electrochemical intercalation
In recent years, transition metal dichalcogenides (TMDs) have received much attention due to their excellent electrical and optical properties. TiS 2 is a kind of layered transition metal dichalcogenide, and with the decrease of the number of layers, the transition from an indirect band gap to a dir...
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Veröffentlicht in: | Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2020-10, Vol.8 (40), p.14138-14145 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | In recent years, transition metal dichalcogenides (TMDs) have received much attention due to their excellent electrical and optical properties. TiS
2
is a kind of layered transition metal dichalcogenide, and with the decrease of the number of layers, the transition from an indirect band gap to a direct band gap will occur, leading to novel electrical and optical properties. In this work, TiS
2
with different numbers of layers was obtained by simplifying the electrochemical intercalation experiment and the influence of the deposition current and the number of layers on the SERS activity of TiS
2
was studied. It was found that when the current was 0.25 mA cm
−2
, the SERS activity of TiS
2
was enhanced greatly with the decrease of the number of layers. Compared with that of the layered bulk TiS
2
, the Raman enhancement factor of the few-layer TiS
2
increased by 2 orders of magnitude to 3.18 × 10
5
, and the detection limit to R6G was as low as 10
−8
M. Such TiS
2
with different layers has been developed for SERS detection and exhibits excellent SERS activity. This was mainly due to the increase in the charge transfer efficiency between the substrate and the organic molecules as the number of layers decreased. This work not only expands the application of TiS
2
with few layers as an active SERS substrate, but also provides an effective method to improve the SERS activity of TMDs. |
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ISSN: | 2050-7526 2050-7534 |
DOI: | 10.1039/D0TC03683H |