GaAs wafers possessing facet-dependent electrical conductivity properties

Intrinsic GaAs(100) and (111) wafers were cut to expose {110} side faces for facet-specific electrical conductivity measurements. Using tungsten probes to make electrical contacts with the wafers, the {111} surface displays much larger current than the {100} and least conductive {110} surfaces, show...

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Veröffentlicht in:Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2020-01, Vol.8 (16), p.5456-546
Hauptverfasser: Hsieh, Pei-Lun, Wu, Shi-Hong, Liang, Ting-Yu, Chen, Lih-Juann, Huang, Michael H
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Sprache:eng
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Zusammenfassung:Intrinsic GaAs(100) and (111) wafers were cut to expose {110} side faces for facet-specific electrical conductivity measurements. Using tungsten probes to make electrical contacts with the wafers, the {111} surface displays much larger current than the {100} and least conductive {110} surfaces, showing that facet-dependent electrical properties are also observable in GaAs crystals. Different degrees of surface band bending are used to explain the electrical facet effects. While symmetric I-V responses were collected for the {100}/{110} facet combination, asymmetric I-V curves were recorded for the {110}/{111} facet combination. Adjusted band diagrams with tunable surface band bending are presented to explain the current-rectifying behaviors. The current rectification effect can be applied to fabricate novel transistors. Current-rectifying I-V curves have been recorded for {110}/{111} facet combination of a GaAs wafer, suggesting the fabrication of facet-controlled transistors.
ISSN:2050-7526
2050-7534
DOI:10.1039/d0tc00265h