Rational construction of self-supported triangle-like MOF-derived hollow (Ni,Co)Se 2 arrays for electrocatalysis and supercapacitors
In this work, we have adopted a facile three-step method for constructing an intriguing bifunctional electrode of self-supported hollow (Ni,Co)Se2 arrays with a metal-organic framework (MOF) precursor. The triangle-like cobalt-based MOF arrays are first grown on a carbon cloth at room temperature, w...
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Veröffentlicht in: | Nanoscale 2019-03, Vol.11 (13), p.6401-6409 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | In this work, we have adopted a facile three-step method for constructing an intriguing bifunctional electrode of self-supported hollow (Ni,Co)Se2 arrays with a metal-organic framework (MOF) precursor. The triangle-like cobalt-based MOF arrays are first grown on a carbon cloth at room temperature, which is followed by an ion exchange/etching process with Ni(NO3)2 to form a critical hollow nanostructure with an incorporated hetero-metal element. The intermediate is then transformed into the final product through solvothermal selenization treatment. Taking advantages of the structural and compositional merits as well as the self-supporting nature, the resultant (Ni,Co)Se2 electrode exhibits excellent electrochemical activity and stability. When tested as an electrocatalyst for the oxygen evolution reaction (OER), the (Ni,Co)Se2 array electrode displayed a low onset overpotential of 226 mV and a small overpotential of 256 mV to afford a current density of 10 mA cm-2. The (Ni,Co)Se2 electrode is also utilized in a supercapacitor, which delivers a high specific capacitance of 2.85 F cm-2 at 2 mA cm-2 and exhibits excellent cycling stability with a capacitance retention of 80.8% after 2000 charge-discharge cycles at 20 mA cm-2. These results demonstrate the significance of the rational design of electrode materials and disclose the potential of our MOF-derived hollow (Ni,Co)Se2 array electrode for a variety of practical applications in energy conversion and storage. |
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ISSN: | 2040-3364 2040-3372 |
DOI: | 10.1039/c9nr00411d |