Non-toxically enhanced sulfur reaction for formation of chalcogenide thin films using a thermal cracker

Sulfur-based metal chalcogenide films have been widely used for high-performance optoelectronic devices due to their attractive optical and electrical properties. Although typical approaches to the chemical deposition of chalcogenide films have some advantages such as large-area coverage and high th...

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Veröffentlicht in:Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2014-01, Vol.2 (35), p.14593-14599
Hauptverfasser: Cho, Dae-Hyung, Lee, Woo-Jung, Park, Sang-Woo, Wi, Jae-Hyung, Han, Won Seok, Kim, Jeha, Cho, Mann-Ho, Kim, Dongseop, Chung, Yong-Duck
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Sprache:eng
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Zusammenfassung:Sulfur-based metal chalcogenide films have been widely used for high-performance optoelectronic devices due to their attractive optical and electrical properties. Although typical approaches to the chemical deposition of chalcogenide films have some advantages such as large-area coverage and high thickness controllability, these processes require highly toxic and expensive hydrogenated materials. Here, we demonstrate an enhanced sulfur reaction with an environmentally safe and cost-competitive method using a thermal sulfur cracker cell. The elevated cracking-zone temperature enhanced the reactivity of sulfur by cracking evaporated sulfur molecules into smaller molecules, and resulted in the formation of a high-quality ZnS phase maintaining a low substrate temperature. The fabricated ultra-thin ZnS film played an excellent role as a buffer layer of the Cu(In,Ga)Se 2 thin-film solar cell, as the film showed high photovoltaic performances.
ISSN:2050-7488
2050-7496
DOI:10.1039/C4TA02507E