Block copolymer multiple patterning integrated with conventional ArFlithography

Block copolymer multiple patterning integrated with conventional ArFlithography

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Veröffentlicht in:Soft matter 2010, Vol.6 (1), p.120-125
Hauptverfasser: Park, Seung Hak, Shin, Dong Ok, Kim, Bong Hoon, Yoon, Dong Ki, Kim, Kyoungseon, Lee, Si Yong, Oh, Seok-Hwan, Choi, Seong-Woon, Jeon, Sang Chul, Kim, Sang Ouk
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container_end_page 125
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container_start_page 120
container_title Soft matter
container_volume 6
creator Park, Seung Hak
Shin, Dong Ok
Kim, Bong Hoon
Yoon, Dong Ki
Kim, Kyoungseon
Lee, Si Yong
Oh, Seok-Hwan
Choi, Seong-Woon
Jeon, Sang Chul
Kim, Sang Ouk
description
doi_str_mv 10.1039/B913853F
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source Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection
title Block copolymer multiple patterning integrated with conventional ArFlithography
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