Research and Development of a Second-Generation Process for Bosentan, an Endothelin Receptor Antagonist

A second-generation manufacturing process from 5-(2-methoxyphenoxy)-[2,2‘-bipyrimidine]-4,6-(1H,5H)-dione to bosentan is based on the synthesis and deprotection of the tert-butyl ether of bosentan using available and inexpensive ethylene glycol mono-tert-butyl ether. This new strategy triggered a ca...

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Veröffentlicht in:Organic process research & development 2002-03, Vol.6 (2), p.120-124
Hauptverfasser: Harrington, Peter J, Khatri, Hiralal N, DeHoff, Brad S, Guinn, Martin R, Boehler, Mark A, Glaser, Karl A
Format: Artikel
Sprache:eng
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Zusammenfassung:A second-generation manufacturing process from 5-(2-methoxyphenoxy)-[2,2‘-bipyrimidine]-4,6-(1H,5H)-dione to bosentan is based on the synthesis and deprotection of the tert-butyl ether of bosentan using available and inexpensive ethylene glycol mono-tert-butyl ether. This new strategy triggered a cascade of process improvements. Isolations are reduced from six to three, and drying operations, from five to two. Process solvents are reduced from six to two. The isolations of two sensitizers are eliminated. Toluene is used in place of methylene chloride. Two aqueous waste streams are eliminated by replacing DMF and ethylene glycol by toluene. Two methanol−isopropyl acetate recrystallizations of bosentan are replaced by the decantation of a suspension of bosentan formate monoethanolate in ethanol−toluene. Finally, the overall yield is increased from 67 to 84% and the final product purity improved from 99.3 to 99.7%.
ISSN:1083-6160
1520-586X
DOI:10.1021/op010234i