(Trimethoxysilyl)carbene:  Photochemistry, Oxidation, and Carbonylation of a Silylcarbene

Photolysis (λ > 345 nm) of matrix-isolated (trimethoxysilyl)diazomethane (1e) leads to the formation of (trimethoxysilyl)carbene (2e), which was characterized by IR and UV−vis spectroscopy. The photochemistry, reaction with molecular oxygen, and carbonylation of 2e were studied in argon matrices...

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Veröffentlicht in:Organometallics 1996-01, Vol.15 (2), p.736-740
Hauptverfasser: Trommer, Martin, Sander, Wolfram
Format: Artikel
Sprache:eng
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Zusammenfassung:Photolysis (λ > 345 nm) of matrix-isolated (trimethoxysilyl)diazomethane (1e) leads to the formation of (trimethoxysilyl)carbene (2e), which was characterized by IR and UV−vis spectroscopy. The photochemistry, reaction with molecular oxygen, and carbonylation of 2e were studied in argon matrices at cryogenic temperatures. These experiments demonstrate that 2e is a triplet ground state carbene. Photolysis at 280 nm results in the formation of 1,1-dimethoxy-1,2-silaoxetane by insertion of the carbene center into one of the adjacent methyl groups.
ISSN:0276-7333
1520-6041
DOI:10.1021/om950782i