(Trimethoxysilyl)carbene: Photochemistry, Oxidation, and Carbonylation of a Silylcarbene
Photolysis (λ > 345 nm) of matrix-isolated (trimethoxysilyl)diazomethane (1e) leads to the formation of (trimethoxysilyl)carbene (2e), which was characterized by IR and UV−vis spectroscopy. The photochemistry, reaction with molecular oxygen, and carbonylation of 2e were studied in argon matrices...
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Veröffentlicht in: | Organometallics 1996-01, Vol.15 (2), p.736-740 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Photolysis (λ > 345 nm) of matrix-isolated (trimethoxysilyl)diazomethane (1e) leads to the formation of (trimethoxysilyl)carbene (2e), which was characterized by IR and UV−vis spectroscopy. The photochemistry, reaction with molecular oxygen, and carbonylation of 2e were studied in argon matrices at cryogenic temperatures. These experiments demonstrate that 2e is a triplet ground state carbene. Photolysis at 280 nm results in the formation of 1,1-dimethoxy-1,2-silaoxetane by insertion of the carbene center into one of the adjacent methyl groups. |
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ISSN: | 0276-7333 1520-6041 |
DOI: | 10.1021/om950782i |