Chemical Vapor Deposition of Single-Walled Carbon Nanotubes Using Ultrathin Ni/Al Film as Catalyst
Chemical vapor deposition (CVD) of single-walled carbon nanotubes (SWNTs) catalyzed using a few nm thick Ni layer supported by a thin Al underlayer is reported. Analysis by transmission electron microscopy shows the SWNTs having a diameter distribution between 1.5 and 2.8 nm. The effect of the Ni/Al...
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Veröffentlicht in: | Nano letters 2003-06, Vol.3 (6), p.731-735 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Chemical vapor deposition (CVD) of single-walled carbon nanotubes (SWNTs) catalyzed using a few nm thick Ni layer supported by a thin Al underlayer is reported. Analysis by transmission electron microscopy shows the SWNTs having a diameter distribution between 1.5 and 2.8 nm. The effect of the Ni/Al bilayer film thickness on the density of the SWNTs is presented. Additionally, circuits of SWNTs bridging opposing Au electrodes coated with Ni/Al catalyst films are fabricated using selective CVD. The current−voltage characteristics and circuit resistance of the nanotube circuits are also discussed. |
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ISSN: | 1530-6984 1530-6992 |
DOI: | 10.1021/nl034154z |