Structure and Growth of Chromophore-Functionalized (3-Aminopropyl)triethoxysilane Self-Assembled on Silicon

We have used X-ray reflectivity, ellipsometry, and X-ray photoelectron spectroscopy to characterize self-assembled films of (3-aminopropyl)triethoxysilane (APS) functionalized with a photosensitive chromophore. Using the evolution of film thickness with time devoted to initial APS adsorption on the...

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Veröffentlicht in:Langmuir 2000-03, Vol.16 (6), p.2651-2657
Hauptverfasser: Heiney, Paul A, Grüneberg, Kirsten, Fang, Jiyu, Dulcey, Charles, Shashidhar, Ranganathan
Format: Artikel
Sprache:eng
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Zusammenfassung:We have used X-ray reflectivity, ellipsometry, and X-ray photoelectron spectroscopy to characterize self-assembled films of (3-aminopropyl)triethoxysilane (APS) functionalized with a photosensitive chromophore. Using the evolution of film thickness with time devoted to initial APS adsorption on the surface, we obtain a model for the structure and growth dynamics of the film.
ISSN:0743-7463
1520-5827
DOI:10.1021/la990557w