Catalyst-Free Growth and Characterization of ZnO Nanorods

Highly oriented ZnO nanorods have been grown on various substrates, such as fused silica, Si(100), and sapphire (110), using a simple catalyst-free CVD method at low temperatures. TEM analyses indicate that epitaxial ZnO nanorods have been grown on sapphire (110) with the ZnO/sapphire orientational...

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Veröffentlicht in:The journal of physical chemistry. B 2002-09, Vol.106 (37), p.9546-9551
Hauptverfasser: Wu, Jih-Jen, Liu, Sai-Chang
Format: Artikel
Sprache:eng
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Zusammenfassung:Highly oriented ZnO nanorods have been grown on various substrates, such as fused silica, Si(100), and sapphire (110), using a simple catalyst-free CVD method at low temperatures. TEM analyses indicate that epitaxial ZnO nanorods have been grown on sapphire (110) with the ZnO/sapphire orientational relationship [001]||[110] and [110]||[001]. In the Si(100) substrate, an amorphous SiO x interfacial layer exists between ZnO nanorods and Si(100). The well-aligned ZnO nanorods on fused silica substrates exhibit a strong UV emission and absorption at around 386 nm under room temperature. Photoluminescence and Raman spectra indicate that there is a very low concentration of oxygen vacancies in the highly oriented ZnO nanorods. Diameter control of the well-oriented and high-quality ZnO nanorods is achievable by variation of the growth conditions.
ISSN:1520-6106
1520-5207
DOI:10.1021/jp025969j