Thermal Conductivity of Anodic Alumina Film at (220 to 480) K by Laser Flash Technique
The thermal conductivity at (220 to 480) K of anodic alumina film of (1.4 to 5) μm thick and about 30 % porosity, which is grown from aluminum foil, is reported. A laser flash technique was employed to carry out measurements of thermal diffusivity of layered anodic aluminum specimen, while the effec...
Gespeichert in:
Veröffentlicht in: | Journal of chemical and engineering data 2010-11, Vol.55 (11), p.4840-4843 |
---|---|
Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The thermal conductivity at (220 to 480) K of anodic alumina film of (1.4 to 5) μm thick and about 30 % porosity, which is grown from aluminum foil, is reported. A laser flash technique was employed to carry out measurements of thermal diffusivity of layered anodic aluminum specimen, while the effective thermal conductivity of anodic alumina film was determined using a two-layered model, which is 1.22 W·m−1·K−1 at 220 K and 1.71 W·m−1·K−1 at 480 K. Agreement in the overlapping temperature range (220 to 300) K with the measurements of Chen is found. The results showed that the thermal conductivity of anodic alumina films has a temperature dependence of amorphous solids, and the apparent thickness dependence of thermal conductivity is not found for anodic alumina films. |
---|---|
ISSN: | 0021-9568 1520-5134 |
DOI: | 10.1021/je100437j |