Device Fabrication by Easy Soft Imprint Nano-Lithography

Device Fabrication by Easy Soft Imprint Nano-Lithography

A new robust and exceptionally simple procedure for soft nano-imprint lithography (Soft-NIL) is described, which provides easy access to nanoscale patterns of a host of active materials on a Si/SiO x surface. Partial curing of a thiol-ene based UV cross-linkable resin (

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Veröffentlicht in:Chemistry of materials 2008-07, Vol.20 (14), p.4595-4601
Hauptverfasser: Moran, Isaac W, Briseno, Alejandro L, Loser, Stephen, Carter, Kenneth R
Format: Artikel
Sprache:eng
Schlagworte:
Patterning of Materials (Micro- and Nanoscale)
Photosensitive Materials
Polymeric Materials
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Beschreibung
Zusammenfassung:A new robust and exceptionally simple procedure for soft nano-imprint lithography (Soft-NIL) is described, which provides easy access to nanoscale patterns of a host of active materials on a Si/SiO x surface. Partial curing of a thiol-ene based UV cross-linkable resin (
ISSN:0897-4756
1520-5002
DOI:10.1021/cm800480z