Initiated Chemical Vapor Deposition (iCVD) of Conformal Polymeric Nanocoatings for the Surface Modification of High-Aspect-Ratio Pores

Initiated chemical vapor deposition (iCVD) was used to coat the surfaces of high-aspect-ratio (∼80:1) pores with functional polymeric films ranging in thickness between 10 and 150 nm. X-ray photoelectron microscopy and electron microprobe analysis confirmed the presence of the polymer coating along...

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Veröffentlicht in:	Chemistry of materials 2008-02, Vol.20 (4), p.1646-1651
Hauptverfasser:	Gupta, Malancha, Kapur, Vivek, Pinkerton, Nathalie M, Gleason, Karen K
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical Vapor Deposition Coatings, Thin films, and Monolayers
Online-Zugang:	Volltext
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