Initiated Chemical Vapor Deposition (iCVD) of Conformal Polymeric Nanocoatings for the Surface Modification of High-Aspect-Ratio Pores

Initiated Chemical Vapor Deposition (iCVD) of Conformal Polymeric Nanocoatings for the Surface Modification of High-Aspect-Ratio Pores

Initiated chemical vapor deposition (iCVD) was used to coat the surfaces of high-aspect-ratio (∼80:1) pores with functional polymeric films ranging in thickness between 10 and 150 nm. X-ray photoelectron microscopy and electron microprobe analysis confirmed the presence of the polymer coating along...

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Veröffentlicht in:Chemistry of materials 2008-02, Vol.20 (4), p.1646-1651
Hauptverfasser: Gupta, Malancha, Kapur, Vivek, Pinkerton, Nathalie M, Gleason, Karen K
Format: Artikel
Sprache:eng
Schlagworte:
Chemical Vapor Deposition
Coatings, Thin films, and Monolayers
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Zusammenfassung:Initiated chemical vapor deposition (iCVD) was used to coat the surfaces of high-aspect-ratio (∼80:1) pores with functional polymeric films ranging in thickness between 10 and 150 nm. X-ray photoelectron microscopy and electron microprobe analysis confirmed the presence of the polymer coating along the pore wall. Static and dynamic contact angle measurements showed that the iCVD nanocoating altered the surface properties of the pores.
ISSN:0897-4756
1520-5002
DOI:10.1021/cm702810j