Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks

Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Chemistry of materials 1994-07, Vol.6 (7), p.927-934
Hauptverfasser: Gabor, Allen H, Lehner, Eric A, Mao, Guoping, Schneggenburger, Lizabeth A, Ober, Christopher K
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Electrical, magnetic and optical properties
Exact sciences and technology
Organic polymers
Physicochemistry of polymers
Properties and characterization
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 934
container_issue 7
container_start_page 927
container_title Chemistry of materials
container_volume 6
creator Gabor, Allen H
Lehner, Eric A
Mao, Guoping
Schneggenburger, Lizabeth A
Ober, Christopher K
description
doi_str_mv 10.1021/cm00043a011
format Article
fullrecord <record><control><sourceid>acs_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1021_cm00043a011</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>d03094832</sourcerecordid><originalsourceid>FETCH-LOGICAL-a330t-c3bd46902f558a05cc2129a8d5361cd4788213c9090cdfb898f193e4bbe53cd33</originalsourceid><addsrcrecordid>eNpt0E9P2zAUAHBr2qR1jBNfIIdJ24QCz3bcOMetAgoqoqIg7Ra92g4xpHZlB4nss-zD4pIJceBky-_3_vgRckDhiAKjx2oDAAVHoPQDmVDBIBcA7COZgKzKvCjF9DP5EuM9JAFMTsi_1eD61kQbM3Q6W9i-9XcBt61V2azFgKo3wf7F3nqX-Sb73Xn1kM381nfDxoTsepfax_Tidhfr7l6U79tsmciP2A_BOPNzTBybzAcdfLSdf0Jn8kuvbWONHr22b_RX8qnBLpr9_-ceuT09uZnN88XV2fns1yJHzqHPFV_rYloBa4SQCEIpRlmFUgs-pUoXpZSMclVBBUo3a1nJhlbcFOu1EVxpzvfI4VhXpbliME29DXaDYagp1LvF1m8Wm_S3UW8xKuyagE7Z-JrCOZOpb2L5yNJazNNrGMNDPS15Keqb5SoVP_tTVvPL-iL576NHFet7_xhc-vK7AzwDnvGWDQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks</title><source>ACS Publications</source><creator>Gabor, Allen H ; Lehner, Eric A ; Mao, Guoping ; Schneggenburger, Lizabeth A ; Ober, Christopher K</creator><creatorcontrib>Gabor, Allen H ; Lehner, Eric A ; Mao, Guoping ; Schneggenburger, Lizabeth A ; Ober, Christopher K</creatorcontrib><identifier>ISSN: 0897-4756</identifier><identifier>EISSN: 1520-5002</identifier><identifier>DOI: 10.1021/cm00043a011</identifier><language>eng</language><publisher>Washington, DC: American Chemical Society</publisher><subject>Applied sciences ; Electrical, magnetic and optical properties ; Exact sciences and technology ; Organic polymers ; Physicochemistry of polymers ; Properties and characterization</subject><ispartof>Chemistry of materials, 1994-07, Vol.6 (7), p.927-934</ispartof><rights>1995 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a330t-c3bd46902f558a05cc2129a8d5361cd4788213c9090cdfb898f193e4bbe53cd33</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/cm00043a011$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/cm00043a011$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,776,780,2752,27053,27901,27902,56713,56763</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=3328361$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Gabor, Allen H</creatorcontrib><creatorcontrib>Lehner, Eric A</creatorcontrib><creatorcontrib>Mao, Guoping</creatorcontrib><creatorcontrib>Schneggenburger, Lizabeth A</creatorcontrib><creatorcontrib>Ober, Christopher K</creatorcontrib><title>Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks</title><title>Chemistry of materials</title><addtitle>Chem. Mater</addtitle><subject>Applied sciences</subject><subject>Electrical, magnetic and optical properties</subject><subject>Exact sciences and technology</subject><subject>Organic polymers</subject><subject>Physicochemistry of polymers</subject><subject>Properties and characterization</subject><issn>0897-4756</issn><issn>1520-5002</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1994</creationdate><recordtype>article</recordtype><recordid>eNpt0E9P2zAUAHBr2qR1jBNfIIdJ24QCz3bcOMetAgoqoqIg7Ra92g4xpHZlB4nss-zD4pIJceBky-_3_vgRckDhiAKjx2oDAAVHoPQDmVDBIBcA7COZgKzKvCjF9DP5EuM9JAFMTsi_1eD61kQbM3Q6W9i-9XcBt61V2azFgKo3wf7F3nqX-Sb73Xn1kM381nfDxoTsepfax_Tidhfr7l6U79tsmciP2A_BOPNzTBybzAcdfLSdf0Jn8kuvbWONHr22b_RX8qnBLpr9_-ceuT09uZnN88XV2fns1yJHzqHPFV_rYloBa4SQCEIpRlmFUgs-pUoXpZSMclVBBUo3a1nJhlbcFOu1EVxpzvfI4VhXpbliME29DXaDYagp1LvF1m8Wm_S3UW8xKuyagE7Z-JrCOZOpb2L5yNJazNNrGMNDPS15Keqb5SoVP_tTVvPL-iL576NHFet7_xhc-vK7AzwDnvGWDQ</recordid><startdate>19940701</startdate><enddate>19940701</enddate><creator>Gabor, Allen H</creator><creator>Lehner, Eric A</creator><creator>Mao, Guoping</creator><creator>Schneggenburger, Lizabeth A</creator><creator>Ober, Christopher K</creator><general>American Chemical Society</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19940701</creationdate><title>Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks</title><author>Gabor, Allen H ; Lehner, Eric A ; Mao, Guoping ; Schneggenburger, Lizabeth A ; Ober, Christopher K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a330t-c3bd46902f558a05cc2129a8d5361cd4788213c9090cdfb898f193e4bbe53cd33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1994</creationdate><topic>Applied sciences</topic><topic>Electrical, magnetic and optical properties</topic><topic>Exact sciences and technology</topic><topic>Organic polymers</topic><topic>Physicochemistry of polymers</topic><topic>Properties and characterization</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gabor, Allen H</creatorcontrib><creatorcontrib>Lehner, Eric A</creatorcontrib><creatorcontrib>Mao, Guoping</creatorcontrib><creatorcontrib>Schneggenburger, Lizabeth A</creatorcontrib><creatorcontrib>Ober, Christopher K</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Chemistry of materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gabor, Allen H</au><au>Lehner, Eric A</au><au>Mao, Guoping</au><au>Schneggenburger, Lizabeth A</au><au>Ober, Christopher K</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks</atitle><jtitle>Chemistry of materials</jtitle><addtitle>Chem. Mater</addtitle><date>1994-07-01</date><risdate>1994</risdate><volume>6</volume><issue>7</issue><spage>927</spage><epage>934</epage><pages>927-934</pages><issn>0897-4756</issn><eissn>1520-5002</eissn><cop>Washington, DC</cop><pub>American Chemical Society</pub><doi>10.1021/cm00043a011</doi><tpages>8</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0897-4756
ispartof Chemistry of materials, 1994-07, Vol.6 (7), p.927-934
issn 0897-4756
1520-5002
language eng
recordid cdi_crossref_primary_10_1021_cm00043a011
source ACS Publications
subjects Applied sciences
Electrical, magnetic and optical properties
Exact sciences and technology
Organic polymers
Physicochemistry of polymers
Properties and characterization
title Synthesis and Lithographic Characterization of Block Copolymer Resists Consisting of Both Poly(styrene) Blocks and Hydrosiloxane-Modified Poly(diene) Blocks
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T19%3A31%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-acs_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Synthesis%20and%20Lithographic%20Characterization%20of%20Block%20Copolymer%20Resists%20Consisting%20of%20Both%20Poly(styrene)%20Blocks%20and%20Hydrosiloxane-Modified%20Poly(diene)%20Blocks&rft.jtitle=Chemistry%20of%20materials&rft.au=Gabor,%20Allen%20H&rft.date=1994-07-01&rft.volume=6&rft.issue=7&rft.spage=927&rft.epage=934&rft.pages=927-934&rft.issn=0897-4756&rft.eissn=1520-5002&rft_id=info:doi/10.1021/cm00043a011&rft_dat=%3Cacs_cross%3Ed03094832%3C/acs_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true