Kinetic model for metal-organic chemical vapor deposition of gallium arsenide with organometallic-arsenic precursors

Kinetic model for metal-organic chemical vapor deposition of gallium arsenide with organometallic-arsenic precursors

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Veröffentlicht in:Chemistry of materials 1990-01, Vol.2 (1), p.39-49
Hauptverfasser: Omstead, Thomas R, Jensen, Klavs F
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container_title Chemistry of materials
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creator Omstead, Thomas R
Jensen, Klavs F
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doi_str_mv 10.1021/cm00007a007
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title Kinetic model for metal-organic chemical vapor deposition of gallium arsenide with organometallic-arsenic precursors
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