Halogen Bonding and Hydrogen Bonding Coexist in Driving Self-Assembly Process
A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N ‘ ,N ‘-tetram...
Gespeichert in:
| Veröffentlicht in: | Crystal growth & design 2004-01, Vol.4 (1), p.53-56 |
|---|---|
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 56 |
|---|---|
| container_issue | 1 |
| container_start_page | 53 |
| container_title | Crystal growth & design |
| container_volume | 4 |
| creator | Zhu, Shizheng Xing, Chunhui Xu, Wei Jin, Guifang Li, Zhanting |
| description | A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N ‘ ,N ‘-tetramethylenediamine (TMEDA) failed to give the corresponding supramolecule. |
| doi_str_mv | 10.1021/cg0300275 |
| format | Article |
| fullrecord | <record><control><sourceid>acs_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1021_cg0300275</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>a729160017</sourcerecordid><originalsourceid>FETCH-LOGICAL-a287t-99d7b2127016b138b61ceef619bd79d25fffeca05c60126f86095054e82e5e273</originalsourceid><addsrcrecordid>eNptkE9Lw0AQxRdRsFYPfoNcPHiIzm66f3KstRqhoqCew2YzW1LSTdmpYr-9KVWL4GmGx-89eI-xcw5XHAS_dnPIAISWB2zApTCpliAPf_6RyY7ZCdECALTKsgF7LGzbzTEkN12omzBPbKiTYlPHP-Kkw8-G1kkTktvYfGylF2x9OibCZdVukufYOSQ6ZUfetoRn33fI3u6mr5MinT3dP0zGs9QKo9dpnte6Elxo4KrimakUd4he8byqdV4L6b1HZ0E6BVwobxTkfY0RGoEShc6G7HKX62JHFNGXq9gsbdyUHMrtDuXvDj17sWNXlpxtfbTBNbQ3SKWkMvmes47KRfceQ9_gn7wvP8JniA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Halogen Bonding and Hydrogen Bonding Coexist in Driving Self-Assembly Process</title><source>ACS Publications</source><creator>Zhu, Shizheng ; Xing, Chunhui ; Xu, Wei ; Jin, Guifang ; Li, Zhanting</creator><creatorcontrib>Zhu, Shizheng ; Xing, Chunhui ; Xu, Wei ; Jin, Guifang ; Li, Zhanting</creatorcontrib><description>A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N ‘ ,N ‘-tetramethylenediamine (TMEDA) failed to give the corresponding supramolecule.</description><identifier>ISSN: 1528-7483</identifier><identifier>EISSN: 1528-7505</identifier><identifier>DOI: 10.1021/cg0300275</identifier><language>eng</language><publisher>Washington,DC: American Chemical Society</publisher><subject>Aliphatic, non-condensed and condensed benzenic, and alicyclic compounds ; Condensed matter: structure, mechanical and thermal properties ; Exact sciences and technology ; Organic compounds ; Physics ; Structure of solids and liquids; crystallography ; Structure of specific crystalline solids</subject><ispartof>Crystal growth & design, 2004-01, Vol.4 (1), p.53-56</ispartof><rights>Copyright © 2004 American Chemical Society</rights><rights>2004 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a287t-99d7b2127016b138b61ceef619bd79d25fffeca05c60126f86095054e82e5e273</citedby><cites>FETCH-LOGICAL-a287t-99d7b2127016b138b61ceef619bd79d25fffeca05c60126f86095054e82e5e273</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/cg0300275$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/cg0300275$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>314,776,780,2752,27053,27901,27902,56713,56763</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=15665689$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Zhu, Shizheng</creatorcontrib><creatorcontrib>Xing, Chunhui</creatorcontrib><creatorcontrib>Xu, Wei</creatorcontrib><creatorcontrib>Jin, Guifang</creatorcontrib><creatorcontrib>Li, Zhanting</creatorcontrib><title>Halogen Bonding and Hydrogen Bonding Coexist in Driving Self-Assembly Process</title><title>Crystal growth & design</title><addtitle>Cryst. Growth Des</addtitle><description>A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N ‘ ,N ‘-tetramethylenediamine (TMEDA) failed to give the corresponding supramolecule.</description><subject>Aliphatic, non-condensed and condensed benzenic, and alicyclic compounds</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Exact sciences and technology</subject><subject>Organic compounds</subject><subject>Physics</subject><subject>Structure of solids and liquids; crystallography</subject><subject>Structure of specific crystalline solids</subject><issn>1528-7483</issn><issn>1528-7505</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2004</creationdate><recordtype>article</recordtype><recordid>eNptkE9Lw0AQxRdRsFYPfoNcPHiIzm66f3KstRqhoqCew2YzW1LSTdmpYr-9KVWL4GmGx-89eI-xcw5XHAS_dnPIAISWB2zApTCpliAPf_6RyY7ZCdECALTKsgF7LGzbzTEkN12omzBPbKiTYlPHP-Kkw8-G1kkTktvYfGylF2x9OibCZdVukufYOSQ6ZUfetoRn33fI3u6mr5MinT3dP0zGs9QKo9dpnte6Elxo4KrimakUd4he8byqdV4L6b1HZ0E6BVwobxTkfY0RGoEShc6G7HKX62JHFNGXq9gsbdyUHMrtDuXvDj17sWNXlpxtfbTBNbQ3SKWkMvmes47KRfceQ9_gn7wvP8JniA</recordid><startdate>20040101</startdate><enddate>20040101</enddate><creator>Zhu, Shizheng</creator><creator>Xing, Chunhui</creator><creator>Xu, Wei</creator><creator>Jin, Guifang</creator><creator>Li, Zhanting</creator><general>American Chemical Society</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20040101</creationdate><title>Halogen Bonding and Hydrogen Bonding Coexist in Driving Self-Assembly Process</title><author>Zhu, Shizheng ; Xing, Chunhui ; Xu, Wei ; Jin, Guifang ; Li, Zhanting</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a287t-99d7b2127016b138b61ceef619bd79d25fffeca05c60126f86095054e82e5e273</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Aliphatic, non-condensed and condensed benzenic, and alicyclic compounds</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Exact sciences and technology</topic><topic>Organic compounds</topic><topic>Physics</topic><topic>Structure of solids and liquids; crystallography</topic><topic>Structure of specific crystalline solids</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zhu, Shizheng</creatorcontrib><creatorcontrib>Xing, Chunhui</creatorcontrib><creatorcontrib>Xu, Wei</creatorcontrib><creatorcontrib>Jin, Guifang</creatorcontrib><creatorcontrib>Li, Zhanting</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Crystal growth & design</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Zhu, Shizheng</au><au>Xing, Chunhui</au><au>Xu, Wei</au><au>Jin, Guifang</au><au>Li, Zhanting</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Halogen Bonding and Hydrogen Bonding Coexist in Driving Self-Assembly Process</atitle><jtitle>Crystal growth & design</jtitle><addtitle>Cryst. Growth Des</addtitle><date>2004-01-01</date><risdate>2004</risdate><volume>4</volume><issue>1</issue><spage>53</spage><epage>56</epage><pages>53-56</pages><issn>1528-7483</issn><eissn>1528-7505</eissn><abstract>A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N ‘ ,N ‘-tetramethylenediamine (TMEDA) failed to give the corresponding supramolecule.</abstract><cop>Washington,DC</cop><pub>American Chemical Society</pub><doi>10.1021/cg0300275</doi><tpages>4</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1528-7483 |
| ispartof | Crystal growth & design, 2004-01, Vol.4 (1), p.53-56 |
| issn | 1528-7483 1528-7505 |
| language | eng |
| recordid | cdi_crossref_primary_10_1021_cg0300275 |
| source | ACS Publications |
| subjects | Aliphatic, non-condensed and condensed benzenic, and alicyclic compounds Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Organic compounds Physics Structure of solids and liquids crystallography Structure of specific crystalline solids |
| title | Halogen Bonding and Hydrogen Bonding Coexist in Driving Self-Assembly Process |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T02%3A07%3A46IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-acs_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Halogen%20Bonding%20and%20Hydrogen%20Bonding%20Coexist%20in%20Driving%20Self-Assembly%20Process&rft.jtitle=Crystal%20growth%20&%20design&rft.au=Zhu,%20Shizheng&rft.date=2004-01-01&rft.volume=4&rft.issue=1&rft.spage=53&rft.epage=56&rft.pages=53-56&rft.issn=1528-7483&rft.eissn=1528-7505&rft_id=info:doi/10.1021/cg0300275&rft_dat=%3Cacs_cross%3Ea729160017%3C/acs_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |